a) Higher
b) Constant
c) Increasing
d) Lower

Answer: d
Explanation: In Plasma Enhanced Chemical Vapor Deposition, deposition occurs at a low temperature. The use of plasma helps to deposit thin films from a gaseous state to a solid state on the substrate; hence it enhances chemical reaction rates. The plasma is created by alternating or direct current discharge between two electrodes. The space between electrodes is filled with reacting gases which contains reactive ions and radicals.