a) Atomic layer chemical vapor deposition
b) Combustion chemical vapor deposition
c) Low pressure chemical vapor deposition
d) Plasma enhanced chemical vapor deposition
Answer: a
Explanation: Atomic layer chemical vapor deposition (ALCVD) involves depositing successive layers of different substances to produce layered, crystalline films. In short, ALCVD is a method in chemical vapor deposition in which deposition occurs through chemisorption of pulsed chemical reactant.
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