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__________ is a PVD technique in which the bulk material is released into the vacuum by bombardment from an ion source.

a) Splattering
b) Sputtering
c) Splashing
d) Spreading

Answer: b
Explanation: Sputtering is a PVD technique in which the bulk material is released into the vacuum by bombardment from an ion source. The material coalesces onto the substrate surface, thus forming a thin film.

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